Muegge Products
Plasma components
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Plasma array (large area)
Item number: MA4000Y-123BC
ProcessEtching & DepositionOutput Connection TypePlasma area 320 mm x 320 mmDielectric materialCeramicsOutput Power [W]2000Frequency [MHz]2450Gas manifoldSingleFlächenplasmaquelle
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Plasma array (large area)
Item number: MA4000Y-153BC
ProcessEtching & DepositionOutput Connection TypePlasma area 320 mm x 320 mmDielectric materialCeramicsOutput Power [W]2000Frequency [MHz]2450Gas manifoldDoubleFlächenplasmaquelle
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Plasma array (large area)
Item number: MA6000Y-013BC
ProcessEtching & DepositionOutput Connection TypePlasma area 700 mm x 226 mmDielectric materialCeramicsOutput Power [W]2x 3000Frequency [MHz]2450Gas manifoldDoubleFlächenplasmaquelle
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Plasma array (large area)
Item number: MA6000Y-023BC
ProcessEtching & DepositionOutput Connection TypePlasma area 797,5 mm x 150 mmDielectric materialCeramicsOutput Power [W]2x 3000Frequency [MHz]2450Gas manifoldDoubleFlächenplasmaquelle
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Plasma array (large area)
Item number: MA6000Y-033BC
ProcessEtching & DepositionOutput Connection TypePlasma area 520 mm x 340 mmDielectric materialCeramicsOutput Power [W]2x 3000Frequency [MHz]2450Gas manifoldDoubleFlächenplasmaquelle
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Radical plasma source (Remote Plasma Source)
Item number: MA1250C-003BC
ProcessEtching & DepositionOutput Connection TypeDielectric materialCeramicsMains voltage nominal [V]230 / 208Output Power [W]1250Frequency [MHz]2450Radikalquelle (Remote-Plasma-Quelle)
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Radical plasma source (Remote Plasma Source)
Item number: MA2000C-083BB
ProcessEtching & DepositionOutput Connection TypeDielectric materialCeramicsMains voltage nominal [V]230 / 208Output Power [W]2000Frequency [MHz]2450Radikalquelle (Remote-Plasma-Quelle)
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Radical plasma source (Remote Plasma Source)
Item number: MA2000C-123BB
ProcessEtching & DepositionOutput Connection TypeDielectric materialCeramicsMains voltage nominal [V]230 / 208Output Power [W]2000Frequency [MHz]2450Radikalquelle (Remote-Plasma-Quelle)
MUEGGE offers plasma components for various applications to support the development and integration of your systems. Our product portfolio provides the right plasma components for low impact, high-density and highly selective etching, separation or cleaning.