Muegge Products

Plasma components

Plasma components
  • Radical plasma source (Remote Plasma Source)

    Item number: MA2000C-133BB

    Process
    Etching & Deposition
    Output Connection Type
    Dielectric material
    Ceramics
    Mains voltage nominal [V]
    230 / 208
    Output Power CW [W]
    2000
    Frequency [MHz]
    2450

    Radikalquelle (Remote-Plasma-Quelle)

    More details
  • Radical plasma source (Remote Plasma Source)

    Item number: MA2000C-143BB

    Process
    Etching & Deposition
    Output Connection Type
    Dielectric material
    Sapphire
    Mains voltage nominal [V]
    230 / 208
    Output Power CW [W]
    2000
    Frequency [MHz]
    2450

    Radikalquelle (Remote-Plasma-Quelle)

    More details
  • Radical plasma source (Remote Plasma Source)

    Item number: MA2000C-223BB

    Process
    Etching & Deposition
    Output Connection Type
    Dielectric material
    Ceramics
    Mains voltage nominal [V]
    230 / 208
    Output Power CW [W]
    2000
    Frequency [MHz]
    2450

    Radikalquelle (Remote-Plasma-Quelle)

    More details
  • Radical plasma source (Remote Plasma Source)

    Item number: MA2000C-233BB

    Process
    Etching & Deposition
    Output Connection Type
    Dielectric material
    Ceramics
    Mains voltage nominal [V]
    230 / 208
    Output Power CW [W]
    2000
    Frequency [MHz]
    2450

    Radikalquelle (Remote-Plasma-Quelle)

    More details
  • Radical plasma source (Remote Plasma Source)

    Item number: MA2000C-703BB

    Process
    Etching & Deposition
    Output Connection Type
    Dielectric material
    Ceramics
    Mains voltage nominal [V]
    230 / 208
    Output Power CW [W]
    2000
    Frequency [MHz]
    2450

    Radikalquelle (Remote-Plasma-Quelle)

    More details
  • Radical plasma source (Remote Plasma Source)

    Item number: MA2000C-713BB

    Process
    Etching & Deposition
    Output Connection Type
    Dielectric material
    Ceramics
    Mains voltage nominal [V]
    230 / 208
    Output Power CW [W]
    2000
    Frequency [MHz]
    2450

    Radikalquelle (Remote-Plasma-Quelle)

    More details
  • Radical plasma source (Remote Plasma Source)

    Item number: MA2000C-743BB

    Process
    Etching & Deposition
    Output Connection Type
    Dielectric material
    Ceramics
    Mains voltage nominal [V]
    230 / 208
    Output Power CW [W]
    2000
    Frequency [MHz]
    2450

    Radikalquelle (Remote-Plasma-Quelle)

    More details
  • Radical plasma source (Remote Plasma Source)

    Item number: MA2000C-753BB

    Process
    Etching & Deposition
    Output Connection Type
    Dielectric material
    Ceramics
    Mains voltage nominal [V]
    230 / 208
    Output Power CW [W]
    2000
    Frequency [MHz]
    2450

    Radikalquelle (Remote-Plasma-Quelle)

    More details

PLASMA COMPONENTS

Semiconductor technology has changed our view of the world – but plasma processing has made it possible to produce products for everyone. High-density microwave-assisted plasma sources perform superiorly in etching and deposition systems that require high etching rates without electrical charging or damage to the material.

.

Our leading role as a manufacturer of plasma components helps you to develop and adapt your systems – while ensuring fast market entry and low CoO. As part of our “”turnkey”” product range, we offer plasma components for a variety of different production tools and applications:

.

  • High density deposition of oxide and nitride layers

    • SU-8 distance

  • Highly selective removal of organic materials
  • Non-oxidizing chemistry for cleaning of oxygen sensitive materials (H2 process)
  • Damage-free cleaning of sensitive surfaces (e.g. sensors) and 3D structures
  • Isotropic chamber cleaning
  • LIGA process (lithography, electroplating and shaping)